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DuPont to establish new R&D and production facilities for c-Si & thin film materials

06 May 2008 | By Mark Osborne | News > Fab and Facilities

Module/cellDuPont is to build a new R&D facility in Hong Kong as well as a production facility in Shenzhen, China for current and future materials used for traditional crystalline silicon (c-Si) cell and module markets. The company will also expand into serving the fast-growing amorphous silicon (a-Si) thin-film market.

"Through investments in materials, technology development and manufacturing, DuPont is accelerating its ability to deliver innovations that will improve the lifetime and efficiency of photovoltaic modules, and also have enough production capability to help keep pace with the fast rising global demand," said David B. Miller, Group Vice President, DuPont Electronic & Communication Technologies.

DuPont said that its Shenzhen facility will be dedicated to the amorphous thin-film market. DuPont expects the growth of thin film to be approximately twice the level of c-Si, which will drive specifications for both new and existing products that serve the thin-film industry.

"The most important factor for continued rapid market growth is achieving continuous year-over-year cost reductions in installed photovoltaic system cost, and we will continue to invest in offerings that meet the needs of this market," Miller said.

 

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