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General Plasma, Inc. announces acquisition of Advanced Energy’s Ion Source line

01 August 2008 | By Síle Mc Mahon | News > Thin Film

General PlasmaGeneral Plasma, Inc., the vacuum thin film coating company, has announced its acquisition of Advanced Energy’s Ion Source product line in June this year. This takeover will see General Plasma integrate its existing Advanced Sources division with the new product line to provide a wider set of services and products to its customer base, elevating General Plasma to the position of world leaders in anode layer ion source technology, according to the company.

“General Plasma extends its hallmark customer support to Advanced Energy’s ion source customers, offering application support and process development services,” said John Madocks, President and Founder of General Plasma. “GPI’s experience applying our patented ion sources to substrate etching, cleaning, treatment and deposition processes will assist the ion source customer base.”

By Síle Mc Mahon

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