Plasma etches and deposition systems manufacturer Oxford Instruments has announced two one-day seminars in Beijing and Taiwan which will focus on nanoscale plasma processing.
Both events follow on from a previous series of Chinese seminars which attracted over 200 participants organised by Oxford Instruments.
The events are scheduled to take place later this year on 14 May in Beijing, China, and 16 May in ITRI, Hsinchu in Taiwan.
In addition to process and application experts from Oxford Instruments Plasma Technology, the seminar will include talks from various guest speakers and specialists from China, Taiwan and Europe.
Each one-day programme will cover a range of topics from Atomic Layer Deposition (ALD), Photovoltaics (PV), Deep Silicon Etch, Power Devices, HBLED and Ion Beam technologies.
From the Institute of Semiconductors, CAS in Beijing Yang Fuhua said: “We hosted a similar event with Oxford Instruments two years ago and it was a great success with attendance of over 100 people. The content was excellent with very informative talks from a diverse range of speakers. The events are a great means of finding out about new techniques in an informal setting, with plenty of time to speak to the experts.”
The opening speaker Jeffrey Seah, business manager for Oxford Instruments Plasma Technology in Asia said: “We are anticipating a large audience at these seminars in China and Taiwan, and are extremely honoured that so many distinguished speakers have accepted our invitation to speak about their work in plasma processing. Our seminars are a great opportunity for the plasma processing community to come together, to share their experiences, and to learn more from leading international experts in their field.”
Oxford Instruments expects an influx of participants from both academic and production sector according to their previous successful seminars in Beijing and Shanghai.
The event is free to attend but online booking is recommenced.