New Product: ‘Baccini Esatto Technology’ from Applied handles double-printed metal line depositi

  • Baccini Esatto Technology
    Baccini Esatto Technology

Product Briefing Outline: Applied Materials ‘Baccini Esatto Technology’, is designed as a high precision, multi-step screen printing capability for Applied’s Baccini back-end solar cell processing systems. The first of several applications of the Esatto Technology is for double-printed metal line deposition where it has been shown to raise absolute cell efficiency by as much as 0.5%.

Problem: The Baccini Esatto Technology is intended as a cost-effective upgrade to current and future Baccini back-end systems with improved reliability and high repeatability. This is an important aspect for next generation cell patterns and is is designed to raise the efficiency of crystalline-silicon (c-Si) solar cells by enabling the fabrication of advanced contact structures.

Solution: A key component of Esatto Technology is the high precision kit that is available for the both Soft Line and the Rotary Line. Esatto Technology was designed to enable advanced contact formation techniques such as double-printed frontside metal lines and the multiple process flows required to create selective emitter structures. The first application of Esatto Technology in production is for double-printed metal lines. This application enables manufacturers to print taller, narrower grid lines, thus reducing the shadowing effect caused by wide grid lines while improving electrical conductivity. In a production environment, Esatto Technology allowed the replacement of single 120μm wide lines with two-layer, double-height lines less than 80μm wide on the finished cell.

Applications: Double-printed metal line deposition of c-Si solar cells.

Platform: Esatto Technology offers c-Si cell manufacturers a comprehensive solution that effectively integrates hardware, software, qualified consumables and production proven processes. The technology enables multiple layers of different materials to be overlaid with better than ±15 μm repeatability.

Availability: September 2009 onwards.

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