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Carbon footprint of PECVD chamber cleaning
Martin Schottler, M+W Zander GmbH, Germany; Mariska de Wild-Scholten, ECN Solar Energy, The Netherlands
The use of perfluorinated gases such as NF3, CF4 or SF6 for PECVD (plasma enhanced chemical vapor deposition) chamber cleaning has a much higher impact on global warming than does the use of onsite-generated F2. This holds true even when supposing that in the future much more effort is paid for the correct abatement and a leak-free supply and take-back chain. This paper will discuss the steps available to the PV industry for control and reduction of carbon emissions in the chamber cleaning process.
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In thin film solarcell manufacturing unit during a-Si claening in process chamber it make volatile SF4 and if we will use proper abatement and wet eaching system then NF3/SF4 and all other gas react with water and make HF. We can also collect HF contaminated water and can be nutralized and dispossed inproper way.