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Product Brief Outline: Sputtering
Materials, Inc. is now offering high-density casted CIG (CuInGa)
targets for thin film deposition in rotatable and planar form factors
for thin film solar production. The casted targets offer high-density
(99% +) materials that offer thin film technicians greater control and
better material utilization in thin film deposition, physical vapor
deposition and sputtering system processing.
Problem: Thin film deposition with low-density
material, such as powder-based metallurgy and cold spray, create
low-density target material that is prone to arcing and contamination
in process. Casting the ternary alloy CuInGa has proven very difficult
because of its unique properties and complicated phase transitions.
Normal casting techniques yield segregated material prone to
contamination by cast forms and other casting equipment.
Solution: Sputtering
Materials has invested over three years of research and development in
creating a process for casting CIG and CIGS onto planar and rotatable
backplates. Casted targets enable a high level of total material
utilization, because the increased density, target life and control are
extended as well as the fact that the targets are reclaimed and reused
to make new targets. There is a significant difference between powder
metallurgy targets and casted CIGS targets; casted target processes can
reuse the spent material by machining clean material off spent targets
and re-casting it to make new targets.
Applications: This
new innovative casting technology also works with high purity materials
such as In, InSn, Sn, Zn, Al, SAC, and others. The nature of
high-density and high-purity material lends itself to be cleanly
reclaimed and re-casted into new targets.
Platform: Materials can be casted to rotatable targets up to 50” in length.
Availability: November 2007 onwards.
