Product Briefing Outline: Advanced Energy Industries
has introduced its latest power platform: the ‘Paramount’ RF-power
delivery system. A key aspect of the new platform is power-delivery
accuracy and control for increasingly complex film stacks and fine
feature sizes. The 3kW Paramount system is well suited for both etch
and deposition processes in semiconductor, FPD, MEMS and solar
Problem: Next-generation device fabrication processes
feature anti-reflective coatings, hard masks, cap layers and stop
layers in their recipes. Process designers must account for these
layers while at the same time accurately etch or deposit the primary
layer that may comprise multiple compositions and doping profiles.
The Paramount platform has been engineered to accommodates these
complexities with ultra-accurate power control and delivery across the
full output range – both on and off 50 ohm – for seamless process
transitions in etch, strip, PECVD, HDP-CVD, PVD and PEALD. Where
pulsing is required to enable next-generation process steps, the
Paramount system’s optional pulse and pulse synchronization features
offer the widest pulse-frequency range available, according to the
company. The system is able to keep pace – in real time – with the most
abrupt plasma-impedance changes, and therefore enables faster
transitions, shorter process steps and reduced process times. Optional
frequency tuning is performed virtually instantaneously (within msec)
– faster than for any other product on the market.
Applications: Etch, strip, PECVD, HDP-CVD, PVD and PEALD.
This half-rack, 3kW RF power supply’s impedance measurement is claimed
to rival the accuracy of a network analyzer, enabling improved power
delivery accuracy and control at 13.56 MHz fixed or variable
frequencies. It is claimed to have accuracy, repeatability and process
control for 50 ohm and non-50 ohm loads.
Availability: July 2007 onwards.