The Anhalt University of Applied Sciences in Köthen, Germany, has purchased Oxford Instruments’ PlasmaPro System100 ICP 65 tool.
The university said the purchase would help it improve its research work. Key features of the PlasmaPro System100 includes an extended process temperature range from cryo to up to 400ºC.
Professor Dr. Bernhard from Anhalt University said: “A maskless silicon dry etch process can be used to texturise the surface of a silicon substrate to create Black-Si.
The reduced reflectivity provides greater potential for light trapping in the cells. Using a dry etch process to create the surface texture is independent of the crystal structure of the silicon substrate and can be applied to one side of the wafer. We chose the PlasmaPro System as it offers all the capabilities we require for our research.”