PV equipment specialist INDEOtec SA has won its fifth PECVD deposition tool order with sale to an undisclosed 'thin film research group' located in the US.
Recently, INDEOtec secured an order for its OCTOPUS II system with French R&D centre, Institut Photovoltaïque d’Ile-de-France (IPVF).
The Octopus II system will be used in the development of c-Si heterojunction (HJ) solar cells. The system can deposit a number of intrinsic and doped amorphous silicon (a-Si:H) materials as well as for passivation processes using Si alloys such as SiNx, SiOx.
The system also uses the ‘Mirror’ reactor concept that allows both sides of a cell to be deposited in the chamber, without the need for extra handling steps such as flipping the wafer and vacuum breakage, reducing process time.
The company claims that the system’s proprietary reactor design and unique electrode arrangement offers superior film thickness uniformity and excellent passivation levels, due to low plasma ignition levels and low ion bombardment.