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Technology development of fine-line crystalline silicon solar cells

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By Zhichun (Jacky) Ni, Director of R&D, China Sunergy; Jiebling Fang, China Sunergy; Weifei Lian, China Sunergy; Xiaolong Si, China Sunergy

Development of fine-line crystalline silicon solar cells is a potential direction for application of high-efficiency and low-cost solar cells in the industry. Fine-line mask-free metallization offers a great potential to increase cell efficiency by reducing metal shadowing losses and surface recombination losses. At China Sunergy, three promising approaches for fine-line crystalline silicon solar cells are currently undergoing research, including processes such as laser doping selective emitter (LDSE) technology, inkjet or aerosol jet printing of metal paste and upgraded screen-printing technology. This paper presents the basic investigations of these three manufacturing technologies, singling out the technology that presents the most potential for further application.

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The eighth edition of Photovoltaics International was published in May 2010. In this issue Enerplan address how the new FiT will impact the French Market, in Materials IBM and NREL discuss the pros and cons of UMG silicon and DERlab puts single-phase inverters to the test in Power Generation.

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