New Product: The RASIRC Steamer ’02 promises improved oxide growth rate in furnaces


Product Briefing Outline: RASIRC has made several new improvements to its RASIRC Steamer '02, which handles controlled and purified water vapor that can then be delivered into most carrier gases for film growth in furnaces. Users of the RASIRC Steamer are claimed to have obtained improved oxide growth rate, film quality, and reduced operating costs.

Problem: Until now, the delivery of water to a process has been difficult. Choices are limited to direct liquid injection (DLI), bubblers, or membrane contactors. DLI is costly and problematic with different flow rates. At low flow rates control has limited accuracy and at high flow rates it is susceptible to bubbles in the liquid which generate erratic values.

Solution: The Steamer technology allows the use of DI water for critical processes by removing volatiles, ionic contaminants, and other impurities from steam. Yield is increased because metals, hydrocarbons, and particles are rejected by the non-porous membrane to deliver the purest steam possible. Throughput is increased with continuous unattended 24/7 operation and up to 20% improvement in growth rate. Compared to pyrolytic torches, there is no thermal build-up with increased flow rate, it's safer as hydrogen and oxygen are eliminated from the oxidation process, it operates at significantly lower temperature, and handles a wide range of pressures and flow rates. Additions to the Steamer '02 include a control loop for the heated steam process line between the Steamer and the tool. Also an integrated flow meter is used for improved repeatability, flow accuracy, and response time. A reduced footprint and simplified installation is achieved through the addition of an internal three-way valve.

Applications: Wide variety of diffusion processes.

Platform: The basic system has a mass flow control device, a vaporizer that contains a source container, a heater and a membrane assembly to allow the carrier gas to enter the source, become saturated with the source vapor, and exit the vaporizer without direct contact with the liquid.

Availability: Currently available.

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