Tokyo Electron disbands thin film JV with Sharp

December 3, 2012
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A small JV company, established between Tokyo Electron (TEL) and Sharp Corporation in 2008 to develop plasma CVD systems for use in thin-film silicon solar photovoltaic cells has been dissolved by TEL.

TEL said that the JV, Tokyo Electron PV had planned to operate for 5 years, yet a review of future activities in the field led to the decision to disband the business a year early.

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However, the company did not say directly that this was due to the recently finalized acquisition of Oerlikon Solar, which had competing technology as well as offered turnkey silicon thin-film manufacturing lines.

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