Suss MicroTec and Rolith have come together to use Rolith’s disruptive nanolithography method in order to develop and construct nanostructuring equipment. Rolith’s nanolithography technology uses near-field optical lithography with cylindrically shaped rolling masks. Sub-wavelength resolution is reached by a phase-interference effect or plasmonic enhancement printing structures. Rolith advises that a continued operation yields a high throughput with low cost production.
“We anticipate the technology will enable the next generation of advanced products, such as high efficiency 3D solar cells, building-integrated PVs, smart glass and superior quality coatings with anti-reflective, anti-glare, self-cleaning and anti-fog qualities”, said Dr. Boris Kobrin, CEO and president of Rolith. “We are delighted to partner up with Suss MicroTec who is known for their world class designs and excellent customer service. With their 60 years of experience with optical lithography systems Suss MicroTec has the necessary expertise and network to help Rolith to bring this much needed technology to market.”
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