Product Briefing Outline: J.A. Woollam has integrated its Flying M-2000 Spectroscopic Ellipsometer into a mapping tool for thin-film uniformity measurements over the entire PV panel. The high accuracy and wide spectral coverage of the M-2000 ensure that every layer in a thin film stack can be measured, while new automation has been designed to ensure fast, precise measurements over the entire panel.
Problem: The performance of thin-film PV depends on the thickness and optical properties of many different layers. Research ellipsometers are used during product development and have helped improve PV designs. There is a need to move research-grade ellipsometry into pilot and production lines to characterize the thickness and optical constants for the various films. In addition, fast measurement speed is necessary to determine thin-film uniformity over the entire panel.
Unlock unlimited access for 12 whole months of distinctive global analysis
Photovoltaics International is now included.
- Regular insight and analysis of the industry’s biggest developments
- In-depth interviews with the industry’s leading figures
- Unlimited digital access to the PV Tech Power journal catalogue
- Unlimited digital access to the Photovoltaics International journal catalogue
- Access to more than 1,000 technical papers
- Discounts on Solar Media’s portfolio of events, in-person and virtual
Or continue reading this article for free
Solution: The AccuMap-SE combines the latest spectroscopic ellipsometry technology into an affordable platform for use in research, pilot, and production lines. Measurements are performed with a Woollam's Flying M-2000 technology that provides accurate spectroscopic ellipsometry from the ultraviolet to the near infrared in a fraction of a second. The ultraviolet spectrum is important when characterizing the crystallinity and optical properties of semiconductor layers, while the near infrared provides film thickness and conductivity measurements for transparent conductive oxide layers. The Flying M-2000 also incorporates a proprietary head with fast, automated alignment to measure films on either front or back of the panel.
Applications: Amorphous and microcrystalline silicon or silicon-germanium films, CIGS, CdTe, CdS, any TCO material, including doped SnO2, ITO, ZnOx, etc.
Platform: For use with any panel size up to 1.1m by 1.5m.
Availability: Currently available.
