aurora solar technologies

July 11, 2017
Aurora Solar Technologies' founder and COO Gordon Deans tells PV Tech how inline measurement and monitoring can protect yield, prevent process excursions and ultimately, ensure maximum profitability for PV manufacturers.
June 21, 2017
Inline solar cell measurement equipment specialist Aurora Solar Technologies (AST) said it had received a volume order from a confidential customer located in China for its ‘Decima’ Gemini systems and ‘Veritas’ wafer and process mapping software to be integrated into new high-efficiency bifacial cell production lines.
May 19, 2017
Inline solar cell measurement equipment specialist Aurora Solar Technologies (AST) said it was collaborating with several leading PV manufacturers in Asia to develop and test an enhanced version of its Veritas visualization software and quality control systems.
April 18, 2017
Inline measurement equipment specialist Aurora Solar Technologies (AST) has secured a new order from the world’s largest solar cell producer, expanding the use of its Decima 3T and Veritas servers for high-efficiency solar cell production.
March 6, 2017
Headquartered in North Vancouver, Canada Aurora Solar Technologies Inc., (AST) has already achieved what many young and aspiring PV technology enterprises struggle to achieve and that is win orders from major solar cell manufacturers. AST has developed a suite of measurement and software control solutions that provide the data to improve solar cell manufacturing yields.
February 7, 2017
Inline measurement equipment specialist Aurora Solar Technologies has won an initial order from an undisclosed customer in mainland China, its first order for its Decima measurement system and ‘Veritas’ software in China.
January 12, 2017
Aurora Solar Technologies has introduced an enhanced version of its ‘Decima’ inline measurement system for quality control of bi-facial solar cells during production. ‘Decima Gemini’ consists of a specialized pair of Decima CD measurement heads that enables the sheet resistance of the wafers' back-surface field and emitter to be measured accurately and simultaneously.

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