By .(JavaScript must be enabled to view this email address) - 28 June 2010, 09:10
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Avancis breaks ground on 100MW 3rd gen CIS thin film plant

With a current capacity of only 20MW, CIS (copper indium selenide) thin-film manufacturer, Avancis has broken ground on a new 100MW plant in Torgau, Germany. The company will ramp the facility in the first quarter of 2012, using its third-generation cell process technology, which achieved 15.1% efficiency (30 x 30 cm², fully encapsulated CIS solar module) in January. The company announced plans in early June.

Avancis has a 20MW facility and employs 150 people at the plant. A further 50 researchers are based in Munich. The new building will be constructed along the same lines as the existing plant, according to the company.

The new-build project on the 25,000 m² site is expected to be completed within the next 18 months.

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Photovoltaics International 14th Edition

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Avancis breaks ground on 100MW 3rd gen CIS thin film plant

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